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> Novellus concept one C1 pecvd dep tool
Novellus concept one C1 pecvd dep tool
The Concept One features a revolutionary production architecture, Multi-station Sequential Deposition, or MSSD, that features 7 deposition stations in the chemical vapor deposition chamber. With 1/7th of the film deposited at each station, Concept One provides a film averaging effect that provides near-perfect uniformity from one wafer to another, while maintaining the very high system throughput characteristic of batch processing systems. In an increasingly competitive semiconductor manufacturing environment, the Concept One is ideally suited for depositing high quality films with the throughput required to improve productivity levels.
S/N 91-40-542 The tool is presently in a sales cleanroom in Austin TX and can be powered up for demonstration purposes.
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