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> Tegal 421 rfg chamber, rf generator, power source
Tegal 421 rfg chamber, rf generator, power source
Tegal 421 RFG Chamber, RF Generator, Power Source
Tegal Plasmaline 421 Resist Stripper w/Chamber, RF Generator, Power Source 421 RFG
* Chamber size: 12" dia. x 11" Deep
* We have powered up this unit.
* The RF Generator works, all controls/indicators function
* We could not apply vacuum or gas to the unit so we are unable to verify that section.
* The Tegal 421 is an oxygen barrel asher used to remove organic films (particularly photoresist). Heat and an oxygen plasma are used to burn or "ash" the organics from the substrate. These organics can be difficult to remove after excessive heat or plasma bombardment. Pieces up to 4 inch may be accommodated and silicon, III-V and glass substrates may be used either individually or in batch mode.